The Japan Society of Applied Physics

[B-3-1] Integrated High-k and Metal Gate Processing Using RTP and ALCVD TM

C. Werkhoven、H. de Waard、E. Shero、C. Pomarede、S. Marcus、J. W. Maes、Z. M. Rittersma、M. A. Verheijen (1.ASM America, Inc.、2.ASM Belgium N. V.、3.Philips Research Leuven)

https://doi.org/10.7567/SSDM.2002.B-3-1