Etching of Organic Low k Dielectric, their Gas Phase and Subsurface Reactions in Ultra High Frequency Plasma

Hisao Nagai; Mineo Hiramatsu; Masaru Hori; Toshio Goto

doi:https://doi.org/10.7567/SSDM.2002.B-4-1

[B-4-1] Etching of Organic Low k Dielectric, their Gas Phase and Subsurface Reactions in Ultra High Frequency Plasma

Hisao Nagai, Mineo Hiramatsu, Masaru Hori, Toshio Goto (1.Nagoya University, Graduate School of Engineering, Department of Quantum Engineering, 2.Meijo University, Faculty of Science and Technology, Department of Electrical and Electronic Engineering)

https://doi.org/10.7567/SSDM.2002.B-4-1

2002 International Conference on Solid State Devices and Materials

[B-4-1] Etching of Organic Low k Dielectric, their Gas Phase and Subsurface Reactions in Ultra High Frequency Plasma