[B-5-3] Negative-Bias-Temperature Instability in Ultra Thin Nitride/Oxide Stack Gate Dielectric

Da-Yuan Lee、Horng-Chih. Lin、Wan-Ju Chiang、Chi-Chun Chen、Chi-Yuan Lin、Tiao-Yuan Huang、Tahui Wang、Mong-Song Liang (1.Institute of Electronics, National Chiao Tung University、2.National Nano Device Laboratories、3.Taiwan Semiconductor Manufacturing Company Ltd.)

https://doi.org/10.7567/SSDM.2002.B-5-3