[B-5-3] Negative-Bias-Temperature Instability in Ultra Thin Nitride/Oxide Stack Gate Dielectric
Da-Yuan Lee, Horng-Chih. Lin, Wan-Ju Chiang, Chi-Chun Chen, Chi-Yuan Lin, Tiao-Yuan Huang, Tahui Wang, Mong-Song Liang
(1.Institute of Electronics, National Chiao Tung University, 2.National Nano Device Laboratories, 3.Taiwan Semiconductor Manufacturing Company Ltd.)
https://doi.org/10.7567/SSDM.2002.B-5-3
