A New Plasma Dry Cleaning Method Applied to Contact and Gate Pre Cleaning

2002 International Conference on Solid State Devices and Materials

Sep 17, 2002 - Sep 19, 2002
Nagoya Congress Center, Nagoya, Japan

Kotaro Miyatani, Kenichi Nishizawa, Yasuo Kobayashi, Yoshihide Tada (1.Technology Development Center, Tokyo Electron Ltd.)