[B-7-1] Electrical Characterization of Aluminum-Oxynitride Stacked Gate Dielectrics Prepared by a Layer-by-Layer Process of Chemical Vapor Deposition and Rapid Thermal Nitridation
Hideki MURAKAMI, Wataru MIZUBAYASHI, Hirokazu YOKOI, Atsushi SUYAMA, Seiichi MIYAZAKI
(1.Graduate School of Advanced Sciences of Matter, Hiroshima University)
https://doi.org/10.7567/SSDM.2002.B-7-1