[B-9-6] Investigation of the Contact Resistance between Ru and Ti/TiN in M1/Plate Contacts of RIS (Ruthenium Insulator Silicon) Capacitor

Ju Young Yun, Byung Hee Kim, Seong Geon Park, Jung Hun Seo, Jong Myeong Lee, Sang Bom Kang, Jeong Hee Chung, Gil Heyun Choi, U In Chung, Joo Tae Moon (1.Process Development Team, Semiconductor R&D Center, Samsung Electronics Co. Ltd.)

https://doi.org/10.7567/SSDM.2002.B-9-6