[C-1-4] Characterization of Si Surface Stress in Various Dielectric Thin Film/Si Structure by Photoreflectance Spectroscopy
Masayuki Sohgawa, Hirofumi Kanda, Takeshi Kanashima, Akira Fujimoto, Masanori Okuyama
(1.Area of Materials and Device Physics, Department of Physical Science, Graduate School of Engineering Science, Osaka University, 2.Dept. Electrical Engineering, Wakayama National College of Technology)
https://doi.org/10.7567/SSDM.2002.C-1-4
