2002 International Conference on Solid State Devices and Materials

Sep 17, 2002 - Sep 19, 2002
Nagoya Congress Center, Nagoya, Japan

[D-8-2] Reduction of Pattern-Edge Defects in Partial SOI by LII (Light-Ion Implantation) Technique

Atsushi Ogura (1.Silicon Systems Res. Labs, NEC Corp.)

https://doi.org/10.7567/SSDM.2002.D-8-2

Tweet