Effective Metal Gettering Technique using Polysilicon Substrate Contact Structure for SOI Devices

Hideki Naruoka; Toshiaki Iwamatsu; Takashi Ipposhi; Nobuyoshi Hattori; Yasuo Inoue; Yoji Mashiko

doi:https://doi.org/10.7567/SSDM.2002.D-8-3

2002 International Conference on Solid State Devices and Materials

2002年9月17日〜 2002年9月19日
Nagoya Congress Center, Nagoya, Japan

[D-8-3] Effective Metal Gettering Technique using Polysilicon Substrate Contact Structure for SOI Devices

Hideki Naruoka、Toshiaki Iwamatsu、Takashi Ipposhi、Nobuyoshi Hattori、Yasuo Inoue、Yoji Mashiko (1.ULSI Development Center, Mitsubishi Electric Corporation)

https://doi.org/10.7567/SSDM.2002.D-8-3

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