Effective Metal Gettering Technique using Polysilicon Substrate Contact Structure for SOI Devices

Hideki Naruoka; Toshiaki Iwamatsu; Takashi Ipposhi; Nobuyoshi Hattori; Yasuo Inoue; Yoji Mashiko

doi:https://doi.org/10.7567/SSDM.2002.D-8-3

2002 International Conference on Solid State Devices and Materials

Sep 17, 2002 - Sep 19, 2002
Nagoya Congress Center, Nagoya, Japan

[D-8-3] Effective Metal Gettering Technique using Polysilicon Substrate Contact Structure for SOI Devices

Hideki Naruoka, Toshiaki Iwamatsu, Takashi Ipposhi, Nobuyoshi Hattori, Yasuo Inoue, Yoji Mashiko (1.ULSI Development Center, Mitsubishi Electric Corporation)

https://doi.org/10.7567/SSDM.2002.D-8-3

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