[P3-10] Impact of Ti Deposition Condition and Subsequent RTA on Contact Resistance of W-Bit Line in sub-micron technology DRAM

Nam-Sung Kim, Il-Gweon Kim, Tae-Seok Kwon, Young-Woo Kweon, Se-Kyeong Choi, Tae-Un Youn, Soo-ik Jang, Joo-Seog Park, Dae-Young Park (1.Device-BC Team, Memory R&D Division, Hynix Semiconductor Inc.)

https://doi.org/10.7567/SSDM.2002.P3-10