[P3-12] SOI/Bulk Hybrid Wafer Process Using SEG (Selective Epitaxial Growth) Technique for High-End SoC Applications
Hajime Nagano、Tsutomu Sato、Kiyotaka Miyano、Takashi Yamada、Ichiro Mizushima
(1.Process & Manufacturing Engineering Center, System LSI Research & Development Center, Semiconductor Company, Toshiba Corporation)
https://doi.org/10.7567/SSDM.2002.P3-12
