[P3-14] One Cleaning Solution for Complete CMOS Processes

T. S. Chao, C. H. Yeh, T. M. Pan, T. F. Lei, Y. H. Li (1.Department of Electrophysics, National Chiao Tung University, 2.National Nano Device Labs., 3.Dep. of ESS, National Tsing Hua Uni., 4.Dep. of EE and Institute of Electronics, National Chiao Tung Uni., 5.Merck-Kanto Advanced Chem. Ltd.)

https://doi.org/10.7567/SSDM.2002.P3-14