[P3-15] Low Power CMOS Process Technologies and Characteristics for advanced High Density Mobile DRAM

Chi Hoon Lee、Nam Hyuk Jo、Dong Gun Park、Duk Dong Kang、Dong-Ho Ahn、Chan Seong Hwang、Tae Sung Kim、Hyeong Joon Kim、wonshik Lee (1.School of Materials Science & Engineering, Seoul National University、2.DRAM Process Architecture Team, Process Development Team, Memory Product & Technology Division, Samsung Electronics Co., Ltd.)

https://doi.org/10.7567/SSDM.2002.P3-15