[P3-5] Interface Defects Responsible for the Negative-Bias Temperature Instability of the Plasma-Nitrided SiON/Si Diodes

Shinji Fujieda、Yoshinao Miura、Motofumi Saitoh (1.Silicon Systems Research Laboratories, NEC Corporation)

https://doi.org/10.7567/SSDM.2002.P3-5