[P3-7] Integrity of Gate Oxide grown on Si implanted Si-substrate

Heung-Jae Cho, Kwan-Yong Lim, Jeong-Youb Lee, Dae-Gyu Park, In-Seok Yeo, Jae-Sung Roh (1.Advanced Process Team, Memory R&D Division, Hynix Semiconductor Inc.)

https://doi.org/10.7567/SSDM.2002.P3-7