[P4-3] Atomic layer-by-layer MOCVD of high-k dielectric thin films with in-situ monitoring by spectroscopic ellipsometry

Yoshishige Tsuchiya、Masato Endoh、Masatoshi Kurosawa、Raymond T. Tung、Takeo Hattori、Shunri Oda (1.Tokyo Institute of Technology, Research Center for Quantum Effect Electronics、2.Musashi Institute of Technology, Department of Electrical and Electronic Engineering)

https://doi.org/10.7567/SSDM.2002.P4-3