[P4-5] Thermal Stability of HfO2/Ultrathin-SiO2/Si Structures
Noriyuki Miyata, Masakazu Ichikawa, Toshihide Nabatame, Akira Toriumi
(1.MIRAI Project, Advanced Semiconductor Research Center (ASRC), National Institute of Advanced Industrial Science and Technology (AIST), 2.The University of Tokyo, 3.MIRAI Project, Association of Super-Advanced Electronics Technology (ASET))
https://doi.org/10.7567/SSDM.2002.P4-5
