[P4-5] Thermal Stability of HfO2/Ultrathin-SiO2/Si Structures

Noriyuki Miyata、Masakazu Ichikawa、Toshihide Nabatame、Akira Toriumi (1.MIRAI Project, Advanced Semiconductor Research Center (ASRC), National Institute of Advanced Industrial Science and Technology (AIST)、2.The University of Tokyo、3.MIRAI Project, Association of Super-Advanced Electronics Technology (ASET))

https://doi.org/10.7567/SSDM.2002.P4-5