The Electrical Conduction of Ultra Thin SiO2 on Slightly Iron-contaminated p-type Si Wafers

M. N. Chang; C. Y. Chen; T. Y. Chang; F. M. Pan; T. F. Lei

doi:https://doi.org/10.7567/SSDM.2002.P4-8

2002 International Conference on Solid State Devices and Materials

2002年9月17日〜 2002年9月19日
Nagoya Congress Center, Nagoya, Japan

[P4-8] The Electrical Conduction of Ultra Thin SiO2 on Slightly Iron-contaminated p-type Si Wafers

M. N. Chang、C. Y. Chen、T. Y. Chang、F. M. Pan、T. F. Lei (1.National Nano Device Laboratories、2.Department of Electronics Engineering, National Chiao Tung University)

https://doi.org/10.7567/SSDM.2002.P4-8

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