The Electrical Conduction of Ultra Thin SiO2 on Slightly Iron-contaminated p-type Si Wafers

M. N. Chang; C. Y. Chen; T. Y. Chang; F. M. Pan; T. F. Lei

doi:https://doi.org/10.7567/SSDM.2002.P4-8

2002 International Conference on Solid State Devices and Materials

Sep 17, 2002 - Sep 19, 2002
Nagoya Congress Center, Nagoya, Japan

[P4-8] The Electrical Conduction of Ultra Thin SiO2 on Slightly Iron-contaminated p-type Si Wafers

M. N. Chang, C. Y. Chen, T. Y. Chang, F. M. Pan, T. F. Lei (1.National Nano Device Laboratories, 2.Department of Electronics Engineering, National Chiao Tung University)

https://doi.org/10.7567/SSDM.2002.P4-8

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