The Japan Society of Applied Physics

[P9-2] No Defect Thermal Process for Thick SOI Bipolar Transistors with Trench Dielectric Isolations

Yoshiaki Nakayama、Koji Eguchi、Shoji Mizuno、Kazunori Kawamoto、Kenji Nakashima、Yukihiko Watanabe (1.Device R & D DENSO CORPORATION、2.Toyota Central R & D Labs. Inc.)

https://doi.org/10.7567/SSDM.2002.P9-2