[A-1-3] New Self-aligned Metal-gate MOSFETs Using Aluminum Substitution Technology
S. Nakamura, H. Shido, T. Kurahashi, S. Kishii, T. Nagata, B. Kumasaka, T. Usuki, S. Sato, Y. Mishima
(1.Fujitsu Laboratories Ltd.)
https://doi.org/10.7567/SSDM.2003.A-1-3