[A-1-3] New Self-aligned Metal-gate MOSFETs Using Aluminum Substitution Technology

S. Nakamura、H. Shido、T. Kurahashi、S. Kishii、T. Nagata、B. Kumasaka、T. Usuki、S. Sato、Y. Mishima (1.Fujitsu Laboratories Ltd.)

https://doi.org/10.7567/SSDM.2003.A-1-3