[A-2-2] New Mechanism for Negative-Bias-Temperature Instability and Its Impact on Scaling of pMOSFETs

Da-Yuan Lee、Horng-Chih Lin、Chi-Chun Chen、Chao-Hsin Chien、Tiao-Yuan Huang、Tahui Wang、Tze-Liang Lee、Shih-Chang Chen、Mong-Song Liang (1.Institute of Electronics, National Chiao-Tung University、2.National Nano Device Laboratories、3.Taiwan Semiconductor Manufacturing Company)

https://doi.org/10.7567/SSDM.2003.A-2-2