The Japan Society of Applied Physics

[A-2-3] Origin of Enhanced Thermal Noise for 100nm-MOSFETs

S. Hosokawa、Y. Shiraga、H. Ueno、M. Miura-Mattausch、H.J. Mattausch、T. Ohguro、S. Kumashiro、M. Taguchi、H. Masuda、S. Miyamoto (1.Graduate School of Advanced Sciences of Matter、2.Research Center for Nanodevices and Systems, Hiroshima University、3.Semiconductor Technology Academic Research Center)

https://doi.org/10.7567/SSDM.2003.A-2-3