High-κ /Oxynitride Gate Dielectric - Searching for Serendipitous Materials -

Masahiko Hiratani; Shin-ichi Saito; Yasuhiro Shimamoto; Shimpei Tsujikawa; Yuichi Matsui; Osamu Tonomura; Kazuyoshi Torii; Jiro Yugami; Shinichiro Kimura

doi:https://doi.org/10.7567/SSDM.2003.A-7-1

2003 International Conference on Solid State Devices and Materials

2003年9月16日〜 2003年9月18日
Keio Plaza Inter-Continental Tokyo (Keio Plaza Hotel), Tokyo, Japan

[A-7-1] High-κ /Oxynitride Gate Dielectric - Searching for Serendipitous Materials -

Masahiko Hiratani、Shin-ichi Saito、Yasuhiro Shimamoto、Shimpei Tsujikawa、Yuichi Matsui、Osamu Tonomura、Kazuyoshi Torii、Jiro Yugami、Shinichiro Kimura (1.Advanced Research Laboratory, Hitachi, Ltd.、2.Central Research Laboratory, Hitachi, Ltd.)

https://doi.org/10.7567/SSDM.2003.A-7-1

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