[A-7-3] Influence of Dielectric Constant Distribution in Stacked Gate Dielectrics on Electron Mobility in Inversion Layers
Mizuki Ono, Takamitsu Ishihara, Akira Nishiyama
(1.Advanced LSI Technology Laboratory, Corporate R&D Center, Toshiba Corporation)
https://doi.org/10.7567/SSDM.2003.A-7-3