[A-7-3] Influence of Dielectric Constant Distribution in Stacked Gate Dielectrics on Electron Mobility in Inversion Layers

Mizuki Ono、Takamitsu Ishihara、Akira Nishiyama (1.Advanced LSI Technology Laboratory, Corporate R&D Center, Toshiba Corporation)

https://doi.org/10.7567/SSDM.2003.A-7-3