The Japan Society of Applied Physics

[A-9-2] Channel direction impact of (110) surface Si substrate on performance improvement in sub-100 nm MOSFETs

Hidetatsu Nakamura, Tatsuya Ezaki, Toshiyuki Iwamoto, Mitsuhiro Togo, Nobuyuki Ikarashi, Masami Hane, Toyoji Yamamoto (1.Silicon Systems Research Labs., NEC Corporation)

https://doi.org/10.7567/SSDM.2003.A-9-2