[B-10-4] Body Contact Structure using Elevated Field Insulator for Ultra-Thin Film SOI-MOSFETs

S. Yamagami、R. Koh、H. Wakabayashi、J.-W. Lee、Y. Saito、A. Ogura、M. Narihiro、K. Arai、H. Takemura、Y. Ochiai、K. Takeuchi、T. Mogami (1.Silicon Systems Research Laboratories and R&D Technical Support Center, NEC Corporation)

https://doi.org/10.7567/SSDM.2003.B-10-4