On the Performance Advantage of undoped ultra thin-film FD-SOI MOSFETs

Hideaki Matsuhashi; Tomohiro Okamura; Takakuni Douseki; Noriyuki Miura; Tadashi Chiba; Shunsuke Baba

doi:https://doi.org/10.7567/SSDM.2003.B-9-2

2003 International Conference on Solid State Devices and Materials

2003年9月16日〜 2003年9月18日
Keio Plaza Inter-Continental Tokyo (Keio Plaza Hotel), Tokyo, Japan

[B-9-2] On the Performance Advantage of undoped ultra thin-film FD-SOI MOSFETs

Hideaki Matsuhashi、Tomohiro Okamura、Takakuni Douseki、Noriyuki Miura、Tadashi Chiba、Shunsuke Baba (1.OKI Electric Industry co., Ltd.、2.NTT Microsystem Integration Laboratories, NTT)

https://doi.org/10.7567/SSDM.2003.B-9-2

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