[C-4-2] Low Resistive Contacts of TiN-Barrier and Ru-Electrode Using PCM Sputtering for MIM-Ta2O5 Capacitors in Giga-Bit DRAMs

Yoshitaka Nakamura、Tsuyoshi Kawagoe、Hiroshi Sakuma、Hiromu Yamaguchi、Isamu Asano、Mitsuhiro Horikawa、Keiji Kuroki、Kenji Tanaka、Yasuhiko Ueda、Hidekazu Goto (1.Elpida Memory, Inc.)

https://doi.org/10.7567/SSDM.2003.C-4-2