A Highly Reliable TiN/Al2O3/TiN MIM Technology for Embedded DRAMs

L.-L. Chao; C. D. Wu; H. L. Lin; Y. L. Tu; K. Y. Lin; C.-Y. Yu; C. Y. Chen; F. J. Shiu; C. T. Ho; C.-S. Tsai; S.-G. Wuu; C. Wang

doi:https://doi.org/10.7567/SSDM.2003.C-4-4

2003 International Conference on Solid State Devices and Materials

2003年9月16日〜 2003年9月18日
Keio Plaza Inter-Continental Tokyo (Keio Plaza Hotel), Tokyo, Japan

[C-4-4] A Highly Reliable TiN/Al2O3/TiN MIM Technology for Embedded DRAMs

L.-L. Chao、C. D. Wu、H. L. Lin、Y. L. Tu、K. Y. Lin、C.-Y. Yu、C. Y. Chen、F. J. Shiu、C. T. Ho、C.-S. Tsai、S.-G. Wuu、C. Wang (1.Memory Technology Division, Taiwan Semiconductor Manufacturing Company, Ltd.)

https://doi.org/10.7567/SSDM.2003.C-4-4

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