Low-birefringent slab waveguide fabricated with hot-embossing for sol-gel derived phenyl-methyl silsesquioxane films

Kenjiro Hasui; Masahiro Tomiki; Naomichi Okamoto

doi:https://doi.org/10.7567/SSDM.2003.C-8-3

[C-8-3] Low-birefringent slab waveguide fabricated with hot-embossing for sol-gel derived phenyl-methyl silsesquioxane films

Kenjiro Hasui、Masahiro Tomiki、Naomichi Okamoto (1.The Graduate School of Electronic Science and Technology, Shizuoka University、2.Permanent affiliation: Corning Technology Center, Corning Japan K. K.、3.Faculty of Engineering, Shizuoka University)

https://doi.org/10.7567/SSDM.2003.C-8-3

2003 International Conference on Solid State Devices and Materials

[C-8-3] Low-birefringent slab waveguide fabricated with hot-embossing for sol-gel derived phenyl-methyl silsesquioxane films