[D-1-4] Conductive Atomic Force Microscopy Analysis for Local Electrical Characteristics in Stressed SiO2 Gate Films

Yukihiko Watanabe, Akiyoshi Seko, Hiroki Kondo, Akira Sakai, Shigeaki Zaima, Yukio Yasuda (1.Toyota Central R&D Labs., Inc, 2.Department of Crystalline Materials Science, Graduate School of Engineering, Nagoya University, 3.Center for Cooperative Research in Advanced Science and Technology, Nagoya University)

https://doi.org/10.7567/SSDM.2003.D-1-4