[D-1-4] Conductive Atomic Force Microscopy Analysis for Local Electrical Characteristics in Stressed SiO2 Gate Films

Yukihiko Watanabe、Akiyoshi Seko、Hiroki Kondo、Akira Sakai、Shigeaki Zaima、Yukio Yasuda (1.Toyota Central R&D Labs., Inc、2.Department of Crystalline Materials Science, Graduate School of Engineering, Nagoya University、3.Center for Cooperative Research in Advanced Science and Technology, Nagoya University)

https://doi.org/10.7567/SSDM.2003.D-1-4