Fabrication of Ultra-Thin Strained Ge-on-Insulator Substrate by Ge-Condensation Technique

Shu Nakaharai; Tsutomu Tezuka; Naoharu Sugiyama; Yoshihiko Moriyama; Shin-ichi Takagi

doi:https://doi.org/10.7567/SSDM.2003.D-3-2

2003 International Conference on Solid State Devices and Materials

Sep 16, 2003 - Sep 18, 2003
Keio Plaza Inter-Continental Tokyo (Keio Plaza Hotel), Tokyo, Japan

[D-3-2] Fabrication of Ultra-Thin Strained Ge-on-Insulator Substrate by Ge-Condensation Technique

Shu Nakaharai, Tsutomu Tezuka, Naoharu Sugiyama, Yoshihiko Moriyama, Shin-ichi Takagi (1.MIRAI project, Association of Super-Advanced Electronics Technology (ASET))

https://doi.org/10.7567/SSDM.2003.D-3-2

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