Fabrication of Ultra-Thin Strained Ge-on-Insulator Substrate by Ge-Condensation Technique

Shu Nakaharai; Tsutomu Tezuka; Naoharu Sugiyama; Yoshihiko Moriyama; Shin-ichi Takagi

doi:https://doi.org/10.7567/SSDM.2003.D-3-2

2003 International Conference on Solid State Devices and Materials

2003年9月16日〜 2003年9月18日
Keio Plaza Inter-Continental Tokyo (Keio Plaza Hotel), Tokyo, Japan

[D-3-2] Fabrication of Ultra-Thin Strained Ge-on-Insulator Substrate by Ge-Condensation Technique

Shu Nakaharai、Tsutomu Tezuka、Naoharu Sugiyama、Yoshihiko Moriyama、Shin-ichi Takagi (1.MIRAI project, Association of Super-Advanced Electronics Technology (ASET))

https://doi.org/10.7567/SSDM.2003.D-3-2

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