[P2-4] Novel Substrate Engineering for High Performance CMOSFETs using Channeling Ion Implantation

M. Kitazawa, T. Yamashita, Y. Kawasaki, T. Kuroi, T. Eimori, M. Inuishi, Y. Ohji (1.Advanced Device Development Dept., Renesas Technology Corp.)

https://doi.org/10.7567/SSDM.2003.P2-4