[P3-14] Improving Electrical Properties of CVD HfO2 by Multi-Step Deposition and Annealing in a Gate Cluster Tool

Chia Ching Yeo、Byung Jin Cho、Moon Sig Joo、Sung Jin Whoang、Dim-Lee Kwong、L. K. Bera、Shajan Mathew、N. Balasubramanian (1.Silicon Nano Device Laboratory, Department of Electrical and Computer Engineering, National University of Singapore、2.Jusung Engineering Co., Ltd.、3.Microelectronics Research Center, The University of Texas at Austin、4.Institutes of Microelectronics)

https://doi.org/10.7567/SSDM.2003.P3-14