[P3-17] The sheet resistance instability in the sub-100 nm tungsten poly-metal wordline due to an in-situ NH3 pre-annealing during the sealing nitride deposition

Kwan-Yong Lim、Jung-Ho Lee、Heung-Jae Cho、Jae-Geun Oh、Byung-Seop Hong、Se-Aug Jang、Yong-Soo Kim、Hong-Seon Yang、Hyun-Chul Sohn (1.Memory R&D Division, Hynix Semiconductor Inc.)

https://doi.org/10.7567/SSDM.2003.P3-17