[P3-17] The sheet resistance instability in the sub-100 nm tungsten poly-metal wordline due to an in-situ NH3 pre-annealing during the sealing nitride deposition

Kwan-Yong Lim, Jung-Ho Lee, Heung-Jae Cho, Jae-Geun Oh, Byung-Seop Hong, Se-Aug Jang, Yong-Soo Kim, Hong-Seon Yang, Hyun-Chul Sohn (1.Memory R&D Division, Hynix Semiconductor Inc.)

https://doi.org/10.7567/SSDM.2003.P3-17