The Japan Society of Applied Physics

[P3-6] An Integrated Gate Stack Process for Sub-90nm CMOS Technology

S. J. Chang, S. Y. Wu, C. L Chen, T. L Lee, Y. M. Lin, Y. S. Tsai, H. D. Su, S. B. Chen, Y. S Chen, M. S. Liang, Y. C. See, Y. C. Sun (1.Taiwan Semiconductor Manufacturing Company)

https://doi.org/10.7567/SSDM.2003.P3-6