The Japan Society of Applied Physics

[P4-10] Effect of Vacuum Annealing on High-k Dy2O3 Thin Films Deposited on Si(100)

S. Ohmi, H. Yamamoto, J. Taguchi, K. Tsutsui, H. Iwai (1.Tokyo Institute of Technology Interdisciplinary Graduate School of Science & Engineering, Dept. of Information Processing, 2.Frontier Collaborative Research Center)

https://doi.org/10.7567/SSDM.2003.P4-10