[P4-14] Impact of Ti/TiN (Glue/Barrier Layer) Formation on Ultra-thin Gate Oxide Reliability (HCI and NBTI) for Deep Sub-micron CMOS Transistors

Chuan H. Liu、M.G. Chen、Y. R. Yang、Y. T. Loh (1.United Microelectronics Corp.)

https://doi.org/10.7567/SSDM.2003.P4-14