The Japan Society of Applied Physics

2003 International Conference on Solid State Devices and Materials

2003 International Conference on Solid State Devices and Materials

Sep 16, 2003 - Sep 18, 2003
Keio Plaza Inter-Continental Tokyo (Keio Plaza Hotel), Tokyo, Japan

[P4-14] Impact of Ti/TiN (Glue/Barrier Layer) Formation on Ultra-thin Gate Oxide Reliability (HCI and NBTI) for Deep Sub-micron CMOS Transistors

Chuan H. Liu, M.G. Chen, Y. R. Yang, Y. T. Loh (1.United Microelectronics Corp.)

https://doi.org/10.7567/SSDM.2003.P4-14