[P5-8] GaAs-MISFETs with nm-Thin Gate Insulating Films Formed by Oxi-Nitridation Process
M. Takebe, N. C. Paul, K. Nakamura, K. Iiyama, S. Takamiya
(1.Graduate School of Natural Science and Technology, Kanazawa University)
https://doi.org/10.7567/SSDM.2003.P5-8