[P5-8] GaAs-MISFETs with nm-Thin Gate Insulating Films Formed by Oxi-Nitridation Process

M. Takebe、N. C. Paul、K. Nakamura、K. Iiyama、S. Takamiya (1.Graduate School of Natural Science and Technology, Kanazawa University)

https://doi.org/10.7567/SSDM.2003.P5-8